Specificities of temperature dependence of saturation current of forward-biased Shottkey diodes TiBx–n–6HSiC

Authors

  • Ya. Ya. Kudryk V. E. Lashkaryov Institute of Semiconductor Physics of NAS of Ukraine, Ukraine
  • S. K. Abdizhaliev V. E. Lashkaryov Institute of Semiconductor Physics of NAS of Ukraine, Ukraine

DOI:

https://doi.org/10.3103/S0735272710010103

Keywords:

Shottkey diode

Abstract

It is researched temperature dependences of forward branch of Shottkey diodes TiBxn–6HSiC. It is detected that forward branch of voltage-current characteristic is described by exponential dependence for voltage interval of 0.05–0.4 V and temperature interval of 100–500 K. At that saturation current and characteristic energy are weakly dependent on temperature. It is shown that redundant component of silicon carbide Shottkey diodes has tunnel behavior, in spite of spatial charge region width into researched diodes is essentially greater than characteristic tunnel length.

References

V. V. Yevstropov, Yu. V. Zhilyayev, M. Dzhumayeva, and N. Nazarov, “Tunnel-Redundant Current into Nondegenerate Barrier p-n- and m-s-Structures AIIIBV on a Basis of Si,” Fizika i Tekhnika Poluprovodnikov 31, No. 2, 152 (1997).

V. V. Yevstropov, Yu. V. Zhilyayev, M. Dzhumayeva, et al., “Dislocation Origin and a Model of Redundant-Tunnel Current into p-n-Structures on a basis of GaP,” Fizika i Tekhnika Poluprovodnikov 34, No. 11, 1357 (2000).

A. Ye. Belyayev, N. S. Boltovets, and V. N. Ivanov, “About Current-Carrying Mechanism, Provided by Dislocations into Gallium Nitride Shottkey Diodes,” Fizika i Tekhnika Poluprovodnikov 42, No. 6, 706 (2008).

Ya. Ya. Kudrik, “Influence of Active Treatment on Shaping Processes and Ohmic Barrier Contacts of Silicone Carbide,” Author’s Abstract for Candidate’s Dissertation in Technical Sciences (IFN im. Lashkaryova NANU, Kiev, 2004).

S. M. Sze, Physics of Semiconductor Devices (Wiley-Interscience, New York, 1969; Mir, Moscow, 1984).

Published

2010-01-10

Issue

Section

Research Articles